| 摘要 |
PURPOSE:To stabilize the sensitivity of a resist by uniformly cooling a resist film on a processing plate only for radiation heat transmission by using a heat acceptor disposed horizontally on the top in a chamber. CONSTITUTION:A resist is coated on a blank mask 13, disposed horizontally in a chamber 1, and baked under the prescribed conditions. Then, a heat acceptor 7 disposed horizontally on the top in the chamber 1 is used to uniformly cool a resist film on a the mask 13 only by the radiation heat transmission by using the acceptor 7 disposed horizontally at the top in the chamber. Then, electromagnetic wave of the prescribed wavelength range or particle beam of the prescribed energy is selectively emitted, and a developing is then performed to form a resist pattern. |
