| 摘要 |
PURPOSE:To improve the uniformity of thickness and quality of the thin film formed on a substrate substantially by uniforming ionization of clusters by making a direction for attracting thermions by anion electrode parallel. CONSTITUTION:An electrode 10a for attracting thermions and a filament 9a are arranged on a plane while is parallel to a proceeding direction of a cluster beam respectively. Consequently, thermions e<-> are attracted from the filament 9a in parallel and run in parallel as they are to be bombarded against the clusters. As a result, an electron density in the cluster beam is made uniform and a distribution of cluster ions is also made uniform without a highly concentrated part only in the central portion. Accordingly, a distribution of the cluster ions which reach the substrate also becomes uniform and a metallic thin film having uniform thickness and quality can be vapor-deposited. |
