发明名称 Process for coating the surface of the semiconductor substrate of a solar cell
摘要 <p>In a process for coating the surface of the semiconductor substrate (2) of a solar cell (4) with a metallisation layer (3) applied by autogenous flame spraying with a spray jet (20), a transverse stream of gas (22) is blown into the spray jet (20) during the application of the metallisation layer (3) in order thereby to reduce the energy load imposed on the semiconductor substrate (2). <IMAGE></p>
申请公布号 DE3337851(A1) 申请公布日期 1985.04.25
申请号 DE19833337851 申请日期 1983.10.18
申请人 SIEMENS AG 发明人 LAUTERBACH,RICHARD,DIPL.-ING.;SCHMIDT,HANS-JOSEF,DIPL.-PHYS.DR.;HECHT,HANS-DIETER,DIPL.-PHYS.
分类号 B05B7/20;B05B15/04;C23C4/12;H01L31/0224;H01L31/18;(IPC1-7):H01L31/18;H01L21/60;C23C7/00 主分类号 B05B7/20
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