| 摘要 |
PURPOSE:To manufacture hexachlorodisilane (Si2Cl6) in high yield by cooling and condensing a mixed gas of polychlorosilane obtained by chlorination of a powdered alloy contg. Si etc. with gaseous Cl, and separating by distillation. CONSTITUTION:A mixed gas having 3-70mol% concn. obtained by mixing gaseous Cl C and an inert gas I such as He, Ne, Ar, and Xe is supplied into a chlorination reactor 10 contg. a finely powdered Si alloy, such as Ca-Si, Mg-Si, and Fe-Si, or metallic Si, having 5-300 meshes, and gaseous Si2Cl6, mixed with SiCl4, octachlorotrisilane, and decachlorotetrasilane, is obtained by a solid-gas reaction by heating at 130-600 deg.C. Then the mixed gas is introduced into a condenser 50 to cool, condense, and liquefy, and then introduced into a distillation tower 70. The SiCl4 and Si2Cl6 are taken out separately as distillates from the top of the tower, and the higher chlorides are introduced into a cracker 90 from the bottom of the tower for cracking higher b.p. fractions, reacted therein with Cl, and converted into SiCl4 and Si2Cl6, which are recovered.
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