发明名称 |
Method for producing a semiconductor layer solar cell |
摘要 |
A method for producing a semiconductor solar cell in which a layer of semiconductor material is applied to a substrate by means of plasma spraying. The energy density in the plasma zone is maintained sufficiently high that the semiconductor vaporizes and is brought out of the plasma zone in the form of a vapor jet, which is condensed on the substrate in the form of a semiconductor layer.
|
申请公布号 |
US4449286(A) |
申请公布日期 |
1984.05.22 |
申请号 |
US19810315641 |
申请日期 |
1981.10.27 |
申请人 |
LICENTIA PATENT-VERWALTUNGS GMBH |
发明人 |
DAHLBERG, REINHARD |
分类号 |
H01L31/04;C23C4/04;H01L31/0224;H01L31/0392;H01L31/052;H01L31/18;(IPC1-7):H01L31/18;B05D1/00 |
主分类号 |
H01L31/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|