| 发明名称 |
Method of photolithographically treating a substrate. |
| 摘要 |
<p>The invention relates to a method of photolithographically treating a substrate, in which a surface of the substrate is treated at least at the area at which it consists of an inorganic material with an organosilicon compound.</p><p>In order to improve the adhesion of a photolacquer layer to be applied, the organosilicon compound used is a 3-aminopropyl-trialkoxysilane in the form of an aqueous solution.</p> |
| 申请公布号 |
EP0107240(A1) |
申请公布日期 |
1984.05.02 |
| 申请号 |
EP19830201451 |
申请日期 |
1983.10.10 |
| 申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
PONJEE, JOHANNES JACOBUS;SMOLDERS, FRANCISCUS JOSEPHUS B.;VERWIJLEN, CHRISTIAAN JOHANNES A. |
| 分类号 |
G03C1/74;G03F7/075;G03F7/09;G03F7/11;G03F7/16;(IPC1-7):03F7/26 |
主分类号 |
G03C1/74 |
| 代理机构 |
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