| 摘要 |
PURPOSE:To prevent deterioration of a write characteristic of a head by making a manufacturing method contain a process for forming a cavity of depth L with respect to an area corresponding to an inner gap part and a rear gap part of a lower pole, and a process for forming the first soft magnetic material layer of film thickness t(t<L) determined in accordance with a desired resolution, on the whole surface of a substrate. CONSTITUTION:A photoresist layer 63 is formed on an insulating layer 62 formed on a substrate 61 so as to cover other area than an inner gap part (area of B) and a rear gap part (area of C) of a lower pole, and a cavity is formed by removing the insulating layer 62 by depth L by etching. Subsequently, the first soft magnetic material layer 64 of film thickness t(t<L) determined in accordance with a desired resolution is formed into a film on the whole surface of the substrate 61. Thereafter, a photoresist layer 65 is formed again so as to cover other area than the inner gap part and the rear gap part of the lower pole. Subsequently, the lower pole is constituted of a laminated body of the first soft magnetic material layer 64 and the second soft magnetic material layer 66. |
