发明名称 |
Planarization technique |
摘要 |
A method of planarizing a light sensitive coating on a substrate having topographical features is provided. The coating which comprises a novolak resin and a diazoquinone sensitizer is exposed to actinic radiation to react substantially all of the sensitizer and then heated by applying heat to the surface of the substrate opposite the coating.
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申请公布号 |
US4427713(A) |
申请公布日期 |
1984.01.24 |
申请号 |
US19830458757 |
申请日期 |
1983.01.17 |
申请人 |
RCA CORPORATION |
发明人 |
WHITE, LAWRENCE K.;POPOV, METODI |
分类号 |
B05D3/02;B05D3/06;G03F7/16;(IPC1-7):B05D3/06 |
主分类号 |
B05D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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