发明名称 PHOTOMASK
摘要 PURPOSE:To enhance resolution, by forming an auxiliary pattern on the right angle corner of a pattern. CONSTITUTION:An amt. of exposed light escaping out of the pattern on its right angle corner due to light diffraction is several times as much as that on the edges of the pattern. Then, the effective exposure is decreased, and the said right angle corner is transferred as the pattern having circular arc angle. But, if an auxiliary pattern is formed on the corner, the decrease of the effective exposure can be prevented and the pattern can be transferred onto a resist with high precision. The position and shape of the auxiliary pattern are appropriately selected in accordance with the size and shape of the pattern. When it is a square or right angle, the same auxiliary patterns 7, 8 are formed on all the corners of the main patterns 5, 6.
申请公布号 JPS58200238(A) 申请公布日期 1983.11.21
申请号 JP19820084308 申请日期 1982.05.19
申请人 TOKYO SHIBAURA DENKI KK 发明人 KAWABUCHI KATSUHIRO;SATOU MASAKI
分类号 G03F1/00;G03F1/54;G03F1/68;G03F7/20;H01L21/027 主分类号 G03F1/00
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