发明名称 |
Formation of electrodes for magnetoresistive sensor |
摘要 |
Electrodes for a magnetoresistive sensor can be formed easily by a method wherein a double-layer structure of Mo and Al on a film of a magnetoresistive material such as permalloy is formed to have a predetermined pattern, firstly by exposing an Al layer to a chemical etching solution or subjecting the Al layer to the ion-milling treatment to give said Al layer said pattern and then subjecting a Mo layer to the plasma etching or reactive sputter etching treatment to give said Mo layer said pattern.
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申请公布号 |
US4411757(A) |
申请公布日期 |
1983.10.25 |
申请号 |
US19820386302 |
申请日期 |
1982.06.08 |
申请人 |
HITACHI, LTD. |
发明人 |
KITADA, MASAHIRO;SUENAGA, MASAHIDE;TSUKADA, YUKIHISA;SHIMIZU, NOBORU;YAMAMOTO, HIROSHI |
分类号 |
H01F41/14;H01L21/28;H01L43/02;H01L43/12;(IPC1-7):C23C15/00 |
主分类号 |
H01F41/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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