| 摘要 |
PURPOSE:To attain a film forming device with glow discharge capable of forming a uniform, homogeneous film over a large area with good repeatability and high efficiency by a method wherein an induction coupled coil for glow discharge is made of a conductive pipe, the pipe being arranged in a deposit chamber, and material gas is led into the deposit chamber thorugh the coil. CONSTITUTION:A copper pipe coil 5 is hung from the top of a bell jar 4 and formed in its pipe wall with a number of gas jet ports 6 directing to the interior thereof with a certain pitch. SiH4 gas is led through the coil 5 and introduced into the deposit chamber 1 at a flow rate of about 100 sccM from the gas jet ports 6 under 1 torr. Then, high frequency power is applied to the coil 5 from a power supply source 7 while turning a rotary table 9 at 10rpm. At this time, since gas is jetted out uniformly, uniform plasma occurs round an A1 drum 8. Thus, an a-Si film formed on the drum 8 becomes uniform and homogeneous and it has good reproducibility. |
