Method for producing a film resistor

摘要

A method for producing a film resistor as a measurement resistor for resistance thermometers, in which a thin resistor film (2) of platinum is deposited on a main surface of an electrically insulating supporting body (1), in the form of a small plate, by cathode sputtering, the electrical resistance of which resistor layer is a measure of the temperature, the resistor layer (2) for achieving the required temperature co-efficient being subjected to an annealing and subsequently being structured by means of a laser beam into the form of a meandering track. In this case, a meandering partial resistor (R1) is cut into the resistor layer (2), the resistance of which partial resistor is less than the desired resistance of the measurement resistor. After temperature treatment of this partial resistor (R1), series resistors are cut into the resistor film (2), the partial resistor (R1) being used for determining the temperature of the resistance film (2) and the meandering structure of the resistor film (2) being interrupted when the resistance (RN) measured simultaneously between the connecting surfaces (21) of the measurement resistor corresponds to the desired resistance (RN,O) determined by a computer at normal temperature. <IMAGE>