发明名称 |
KOMPOSITION FOR ELEKTROPLETERING AV RUTENIUMMETALL PA UNDERLAG |
摘要 |
Improved baths for the electrodeposition of ruthenium metal on various substrates. The ruthenium metal baths are formulated with a complex of ruthenium metal and sulphamic acid wherein the molar ratio is one mole of ruthenium metal and from about 4 to 10 moles of sulphamic acid. For most purposes, certain selective metals are also present in the baths, which are maintained at a pH ranging from about 1.0 to 2.2. The process for utilizing said baths to plate substrates with essentially pure ruthenium metal is also described and claimed. |
申请公布号 |
SE8203084(L) |
申请公布日期 |
1982.12.03 |
申请号 |
SE19820003084 |
申请日期 |
1982.05.17 |
申请人 |
HOOKER CHEMICALS PLASTICS CORP |
发明人 |
BAKER K D;RYMWID Y |
分类号 |
C25D3/50;C25D3/56;(IPC1-7):C25D3/50 |
主分类号 |
C25D3/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|