发明名称 CORRECTING DEVICE FOR PHOTO-MASK
摘要 PURPOSE:To correct a pattern rapidly with high accuracy by forming the correcting device so that beams can be passed under a condition that a rectangular slit is turned around on optical axis and irradiating rectangular beams inclined at a desired angle onto the mask. CONSTITUTION:The rectangular slit 15 changing laser beams into rectangular luminous flux is mounted onto the passage of laser beams irradiated to the surface of the photo-mask 1 to be corrected. The slit 15 supports four slit plates 17a-17d mutually moved in the rectangular direction to an annular supporting ring 16. The slit plates 17a-17d are each engaged with the screw-shaped shafts 19a-19d of motors 18a-18d independently supported to the ring 16, and are movable fore and aft through the drive of the motors 18a-18d, and the predetermined rectangular slit is formed. The ring 16 is turned around a shaft at an arbitrary angle through the drive of a motor 22.
申请公布号 JPS57192024(A) 申请公布日期 1982.11.26
申请号 JP19810076536 申请日期 1981.05.22
申请人 HITACHI SEISAKUSHO KK 发明人 KAWANABE TAKAO
分类号 G03F1/00;G03F1/72;H01L21/027 主分类号 G03F1/00
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