| 摘要 |
PURPOSE:To make the boundary part of a photo mask pattern smooth to enhance the exfoliation strength, by washing an aluminoborosilicate glass substrate, where the coefficient of linear expansion is a specific value or below, with an aqueous solution where the aqueous solution of condensed phosphoric acid and a neutral detergent are mixed. CONSTITUTION:After the surface of a glass substrate for photo mask which consists of the aluminoborosilicate glass including MgO or PbO and has 60X 10<-7>/ deg.C coefficient of linear expansion is polished, this glass substrate is washed with pure water. Next, the glass substrate is washed with an aqueous solution where the aqueous solution of condensed phosphoric acid and a neutral detergent are mixed. Next, the glass substrate is washed with pure water and is dried. When a pattern is formed on, for example, chromium mask balnks made from this washed glass substrate, the boundary of the pattern of this photo mask becomes smooth, and the exfoliation strength of the chromium film is enhanced. |
