| 摘要 |
PURPOSE:To clean surfaces of semiconductor wafers and to reduce contact resistance and scatter in resistance values by flashing powerful light on surfaces of specimens with a metallic film producer which is maintained under a high vacuum. CONSTITUTION:Specimens 50 mounted on specimen holders 40 respectively are subjected to high vacuum suction inside a mirror body 10 and are heated momentarily up to, for example, nearly a fusion point of the specimens 50 as they are rotating inside the mirror body 10 by means of a plural number of flash lamps 60 arranged inside the mirror body. Adequate effect can normally be gained by only one pulse, however, a plural times of flashing may be carried out as required. |
