发明名称 Post-exposure treating solution for photosensitive graphic arts articles
摘要 A desensitizing solution and process for using the solution are disclosed to desensitize a diazo photosensitive printing plate after development. The solution comprises a water soluble desensitizing agent capable of reacting with any residual photosensitive diazo on the developed plate to render the diazo incapable of forming an oleophilic substance and a filming agent selected from water soluble aliphatic polyols have less than eight carbon units, the acid derived monoesters of these polyols, and the alkali metal salts of the monoesters.
申请公布号 US4329422(A) 申请公布日期 1982.05.11
申请号 US19790051478 申请日期 1979.06.25
申请人 NAPP SYSTEMS (USA), INC. 发明人 LANGLAIS, EUGENE L.
分类号 B41N3/08;C09K3/00;G03C;G03C1/52;G03F7/00;G03F7/32;G03F7/40;(IPC1-7):G03C5/24 主分类号 B41N3/08
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