发明名称 FORMATION OF CDTE FILM
摘要 PURPOSE:To control impurity doping easily, by using a primary evaporation source composed of CdxTe1-x and a secondary evaporation source composed of CdTe and impurity to be doped simultaneously to form a CdTe film by means of evaporation. CONSTITUTION:A primary evaporation source is composed of CdxTe1-x (0<=X<= 1), as an evaporation source for a CdTe film in a thin-film photoelectric transducer. A secondary evaporation source is composed of CdTe and impurity to be doped in CdTe. An N- or P-film of CdTe is deposited with primary and secondary evaporation sources simultaneously. In this case, if the CdTe film is made to be of P type, at least one impurity will be chosen and included among lithium, copper, silver, gold, lead, phosphor, and antimony with X<0.5. If it is made to be of N type, at least one impurity will be selected and included from among indium, aluminium, and iodine with X>0.5.
申请公布号 JPS5766622(A) 申请公布日期 1982.04.22
申请号 JP19800142774 申请日期 1980.10.13
申请人 RICOH KK 发明人 MORI KOUJI;SAKURAI KOUICHI;ITAGAKI MASANORI
分类号 H01L27/146;H01L21/203;H01L21/363;H01L31/10 主分类号 H01L27/146
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