| 摘要 |
PURPOSE:To improve the uniformity of the development of positive resist by providing a cylindrical cup having plural holes on the side face of the rotating shaft of a spinner and dropping a developer from the holes through storing semiconductor wafers in the cup. CONSTITUTION:A cup 10 having plural holes on the side face are provided to the rotating shaft 1 of a spinner and silicone wafers 3 coated with poritive resist 4 are set inside the cup. When the cup is rotated at the rotational speed of several tens to hundreds rpm and the developer 6 is dropped from a nozzle 5 intermittently, some volume of developer stays in the cup 10 and the positive resist 4 flows from the holes 11 together with the developer 6. After dropping water as a rinsing solution, the cup is rotated at a high speed to dry the contents. Thus, uniform development is made available by dipping development. |
