| 摘要 |
PURPOSE:To form a thin film for optical recording of high performance consisting of VO2 which is difficult to peel off from a substrate by sputtering using a V metal target on the substrate heated to specific temp. in an N2 atmosphere having a degree of vacuum of a specific range contg. a specific amount of O2. CONSTITUTION:Sputtering is performed on a substrate of glass or the like heated to 300-500 deg.C in a gaseous N2 atmosphere having 1X10<-2>-8X10<-2> Torr degrees of vacuums contg. 2-7% O2 by using V metal or a suitable ratio of impurity metal selected from the group of Mo, W, Nb, Ta, Ti and placed on V metal or an alloy of V and said metal as a target. Thereby, the medium for optical recording having a smooth surface which is exclusively VO2 or contains VO2 and impurity metal and is difficult to peel from the substrate, on the substrate, and having the semiconductor phase-metal phase transition temp. close to room temp. is easily obtained. Recorded parts above the transition point are formed by laser light irradiation, and are read by the difference in the light reflectance between the recorded parts and the unrecorded parts. The erasing of the recording is also made possible by the hysteresis characteristics of the temp. of the medium and the reflectance of light. |
