发明名称 DEVICE FOR HEAT INFLUENCE COMPENSATION IN THE ADJUSTING AND ILLUMINATING APPARATUS
摘要 1534450 Cooling exposing apparatus ELEKTROMAT VEB 16 Aug 1977 [17 Aug 1976] 34360/77 Heading G2A Exposing apparatus especially for use in the production of microelectronics has a stencil 3 located between a light source and a mounting 1 for a photo-sensitive substrate (not shown), both the stencil 3 and the mounting 1 being cooled by a thermostatically controlled device. As shown, mounting 1 is cooled by circulating fluid under the control of a thermostat 5. Stencil 3 is cooled by gas supplied by a nozzle 14. The temperature of the gas is controlled by a thermostat 9 and by a control unit 7. Unit 7 receives an input from a sensor 6 and from a shutter 13, since the temperature rises when the shutter opens.
申请公布号 CS206603(B1) 申请公布日期 1981.06.30
申请号 CS19770005407 申请日期 1977.08.17
申请人 LANDGRAF,SIEGARD,DD;WEBER,ULF,DD;STAPF,MICHAEL,DD;WENZEL,MARTIN,DD;HEYNE,MICHAEL,DD 发明人 LANDGRAF,SIEGARD,DD;WEBER,ULF,DD;STAPF,MICHAEL,DD;WENZEL,MARTIN,DD;HEYNE,MICHAEL,DD
分类号 H01L21/312;C23C14/04;G03B17/55;G03F7/20 主分类号 H01L21/312
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