发明名称 Gas sensor application method for measuring minor portions - uses semiconductor whose resistance changes when exposed to gas in thermostatic chamber for maintaining working temp.
摘要 <p>The sensor application procedure enables it to measure the smallest proportions of a gas, e.g. in atmospheric air or flue gases, consisting of several components. The sensor contains a semiconductor whose resistance changes when exposed to the gas to be analysed. The semiconductor is heated to a working temp. of about 180 to 360 degrees C. and kept at that point. The sensor is installed in a thermostatic chamber. The gas to be examined is set at a constant hygrometric condition and supplied to the chamber at a constant volume per unit of time. The gas is brought and held to a temp. in the region of 2 to 200 degrees C. before reaching and/or within the chamber. The latter can be heated by an electrical element.</p>
申请公布号 DE2924481(A1) 申请公布日期 1981.01.22
申请号 DE19792924481 申请日期 1979.06.18
申请人 BIELER & LANG GMBH 发明人 DITTRICH,JUERGEN
分类号 G01N27/12;(IPC1-7):01N27/12 主分类号 G01N27/12
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