| 摘要 |
PURPOSE:To produce a high quality dielectric layer having no clack stably with high yield, by forming an encapsulating material layer around a substrate thereafter forming a deposition film having same quality with the upermost layer and coating with a surface layer or a deposition film. CONSTITUTION:Prior to the formation of a surface layer contacting with the gas discharge space of a dielectric layer, encapsulation material layers 6, 16 composed of glass having low melting point are formed around substrates 1, 11 formed with dielectric layers. Then deposition films 7, 17 composed of alumina having same quality with the upermost layers 5, 15 are deposited on the upper face of the upermost layers 5, 15 on the substrates 1, 11 under such condition where the outside at the forming position including the encapsulation material layers 6, 16 is masked for the purpose to form the surface layer. Thereafter surface layers 8, 18 composed of MgO are deposited. Consequently high quality dielectric layer having no clack can be stably formed and high quality indication panel can be produced with high yield. |
