| 发明名称 |
CHEMICAL VAPOR DEPOSITION |
| 摘要 |
<p>A process for chemical vapor deposition of ruthenium on heat resistant substrates employing ruthenium 1, 3 dione compounds as volatile sources and causing the volatile material to impact on a heated receiving substrate in random fashion in a quiescent, low-pressure atmosphere.</p> |
| 申请公布号 |
CA1087040(A) |
申请公布日期 |
1980.10.07 |
| 申请号 |
CA19760252239 |
申请日期 |
1976.05.11 |
| 申请人 |
INCO LIMITED |
发明人 |
CROSBY, JEFFREY N.;HANLEY, ROBERT S. |
| 分类号 |
C22B11/02;B23P15/28;C23C16/18;C25C7/02;H01H1/02;(IPC1-7):23C11/02 |
主分类号 |
C22B11/02 |
| 代理机构 |
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代理人 |
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| 地址 |
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