| 摘要 |
PURPOSE:To improve positional precision and work efficiency and facilitate to connect inspection and correction devices by providing a special pattern in addition to a semiconductor element pattern making this position as a reference origin. CONSTITUTION:When different pattern inspection and correction devices are used, under the influence of the method of fixing the photomask or the external dimensions of the photomask, deviations DELTAx, DELTAy assume different values and the position of virtual reference origin 13 is varied. For this reason, apart from semiconductor element pattern 4, origin reference pattern 8 is provided at the specified position of photomask 1, and by making it easy to detect this reference pattern 8, deviations DELTAx, DELTAy are corrected and set at the reference origin. Pattern 8 is placed at an easily detectable position on mask 1 as an origin with shape and size convenient for setting. By this structure, defective pattern 9 is detected and its position can be stored or recorded, so that the mask can be corrected easily and with high precision. |
