| 摘要 |
OF THE DISCLOSURE A photosensitive recording material suited for the production of metal mask images which material comprises (1) a photosensitive layer containing a photosensitive nitrone of the formula: in which : R is an aromatic hydrocarbon group including a substituted aromatic hydrocarbon group, and R1 is an aromatic or heterocyclic group including these groups in substituted form, in admixture with one or more polymers that are soluble in an alkaline aqueous liquid, said layer becoming insoluble in said liquid when said layer is exposed to actinic radiation, and (2) in contact with the said photosensitive layer a subjacent supported metallic imaging layer of a metal, which is aluminium, zinc, tellurium or a tellurium alloy comprising at least 50 atomic percent or tellurium having a thickness in the range of 50 nm to 500 nm or a subjacent metallic imaging layer of bismuth having a thickness in the range of 25 nm to 300 nm. |
