| 摘要 |
PURPOSE:To form a positive type resist with high contrast and high sensitivity. CONSTITUTION:A substrate to be processed is coated with a pattern forming material consisting of a compd. having an isopropenyloxycarbonyl group and a functional group capable of reacting with the isopropenyloxycarbonyl group and a compd. which generates an acid when irradiated with light or ionized radiation and the coated substrate is dried and heated to a temp. at which the groups can react with each other to form a crosslinked resist film. This resist film is patternwise irradiated with light or ionized radiation and developed with an alkaline aq. soln. |
