发明名称 MANUFACTURE FOR COMPOUND SEMICONDUCTOR DEVICE
摘要 PURPOSE:To increase the activation rate of impurity injected and to increase the crystallization, by providing holes in which injected ions can be entered on the surface of a compound semiconductor in advance.
申请公布号 JPS53142877(A) 申请公布日期 1978.12.12
申请号 JP19770058292 申请日期 1977.05.19
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SUGAWA TOSHIO;KONUMA TAKESHI
分类号 H01L29/93;H01L21/265;H01L29/47;H01L29/872;H01L29/92 主分类号 H01L29/93
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