| 发明名称 |
ELECTRON BEAM EXPOSURE METHOD |
| 摘要 |
PURPOSE:To increase pattern density on surfaces by providing bench marks corresponding to each field on pattern forming surfaces on the surface opposite to the patterned surface of a wafer, and feeding the position information obtained by scanning these with an electron beam back to an electron beam scanning system for the pattern-forming surface in making exposure. |
| 申请公布号 |
JPS5348677(A) |
申请公布日期 |
1978.05.02 |
| 申请号 |
JP19760122963 |
申请日期 |
1976.10.15 |
| 申请人 |
FUJITSU LTD |
发明人 |
NAKAYAMA NORIAKI;FURUKAWA YASUO;OKABE MASAHIRO;IGAKI SEIGO |
| 分类号 |
H01J37/305;G03F1/00;G03F1/76;G03F9/00;G05D3/00;G05D3/12;H01J37/30;H01L21/027;H01L21/312;H01L21/68 |
主分类号 |
H01J37/305 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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