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发明名称
HEAT TREATMENT METHOD OF SEMICONDUCTOR WAFERS
摘要
申请公布号
JPS5325351(A)
申请公布日期
1978.03.09
申请号
JP19760099697
申请日期
1976.08.23
申请人
HITACHI LTD
发明人
FUKUYAMA MASATAKA;YAMANAKA KOUJI
分类号
H01L21/22;H01L21/324
主分类号
H01L21/22
代理机构
代理人
主权项
地址
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