发明名称 |
HOLDING OF SUBSTRATE |
摘要 |
PURPOSE:To make adhere easily the substrate for molecular beam epitaxial growth or vacuum evaporation to the substrate holder, by producing a liquid alloy having good stability by contacting plural number of metals being able to react at room temperature to form an alloy (e.g. Ga and In), and by putting this alloy between the above-mentioned substrate and the substrate holder in the form of a thin layer. |
申请公布号 |
JPS52151679(A) |
申请公布日期 |
1977.12.16 |
申请号 |
JP19760069442 |
申请日期 |
1976.06.14 |
申请人 |
NIPPON TELEGRAPH & TELEPHONE |
发明人 |
MARUYAMA TOORU;AMANO TOSHIAKI;OGAWA SHIGEO;WAHO TAKAO |
分类号 |
C30B23/02;C23C14/50;C23C14/54;C23C16/44;C23C16/458;C30B23/08 |
主分类号 |
C30B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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