发明名称 Chemical cleaning bath for semiconductor - uses one container for all cleaning steps allowing water saving and permits ultrasonic cleaning where necessary
摘要 <p>The cleaning bath can be used for carrying out several different rinsing and cleaning processes has only one container (2) which in its lower part (4) is provided with an inlet pipe (5) and an outlet pipe (6) and in the upper part, has an overflow (20) and a detachable lid (3) containing spray nozzles (43). The inlet pipe (5) and outlet pipe (6) are mounted in the base (4) of the container (2) and are connected up with the supply and waste pipes (11,12) respectively of the bath. An ultrasonic system (32) can be fitted in the container (2) to allow ultrasonic cleaning where necessary. The inlet pipe (5) can be fitted with a filter whilst the output pipe can be fitted with a measuring cell (18) to determine the electric resistance valve of the outflowing liquid. When the outflowing liquid no longer exceeds the preset electric resistance value the cleaned bodies can be removed from the bath and other substrate bodies requiring cleaning can be immersed into the liquid still present in the container.</p>
申请公布号 DE2558239(A1) 申请公布日期 1977.06.30
申请号 DE19752558239 申请日期 1975.12.23
申请人 SIEMENS AG 发明人 SIGUSCH,REINER,ING.
分类号 B08B3/02;B08B3/12;C23G3/00;(IPC1-7):08B3/02;01L21/306 主分类号 B08B3/02
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