METHOD FOR ESTABLISHING SOAKTIME OF PROCESS SEMICONDUCTOR OXIDATION,申请号KR19950059505-传众专利搜索

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发明名称	METHOD FOR ESTABLISHING SOAKTIME OF PROCESS SEMICONDUCTOR OXIDATION
摘要
申请公布号	KR0165320(B1)	申请公布日期	1999.02.01
申请号	KR19950059505	申请日期	1995.12.27
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	JUN, YONG-MIN;JANG, JAE-MAN;CHOE, SANG-KOOK;PARK, CHAN-SIK
分类号	H01L21/31;H01L21/316;H01L21/66;(IPC1-7):H01L31/16	主分类号	H01L21/31
代理机构		代理人
主权项
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