发明名称 Lithographic plate comprising a light-sensitive polymer
摘要 A light sensitive polymer, susceptible to crosslinking on exposure to actinic light. The polymer contains the recurring unit; R1R2 ¦¦ --C-C-- ¦¦ ¦R3 O=C ¦ O ¦ CH2 ¦ CH-R4 ¦ CH2-R5 R1, R2 and R3 are each selected from the group consisting of hydrogen, halogen and lower alkyl. At least one of R4 and R5 is an azidobenzoyloxy or azidonaphthoyloxy group. The other of R4 and R5 is selected from the group consisting of hydroxyl, halogen, alkoxy, aryloxy, aralkoxy, alkoxyalkoxy, aryloxyalkoxy, alkoxyaryloxy, aryloxyaryloxy, alkylacyloxy, arylacyloxy, alkenylacyloxy, aralkenylacyloxy, heterocyclic substituted alkenylacyloxy, azidobenzoyloxy and azidonaphthoyloxy.
申请公布号 US3909269(A) 申请公布日期 1975.09.30
申请号 US19730415356 申请日期 1973.11.13
申请人 WESTERN LITHO PLATE & SUPPLY CO. 发明人 PARKER, EDWARD H.;HARRIS, EDWARD M.;MEADOR, JIM D.
分类号 C08F8/00;C08F20/34;C08G59/16;G03F7/012;(IPC1-7):G03C1/70;G03C1/52 主分类号 C08F8/00
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