| 摘要 |
PURPOSE: To produce the accurate image of a high-resolution mask by a method wherein a substrate and the mask are simultaneously scanned extending over the fields of the substrate and the mask, then, the substrate is moved in the lateral direction to expose a new scanning region of the substrate, then, the scanning is repeated several times to expose the whole substrate. CONSTITUTION: A substrate 10 is scanned by a substrate stage 12 extending over the hexagonal irradiation region of the substrate 10 and at the same time, a mask 14 is scanned by a mask stage 16 extending over the hexagonal irradiation region of the mask 14 and the substrate length in the scanning direction is covered. Then, the mask is reset to its former position several times by the stage 16 and the substrate 10 is turned to a place in the direction rectangular to the scanning direction by the stage 12 and is moved by an amount, which is called 'an effective scanning width', here. Subsequently to this, a new scanning is generated by the accute movement of the substrate and the stage 16. The effective scanning width and an radiation source system are designed so that when the effective scanning width and the radiation source system are combined with each other, the combination has such characteristics as to make a transition, which is completely seamless and has not the ununiformity of a strength, from one scanning to the following scanning adjacent to the one scanning. This exposure process, which is called a [scanning and repeat] mechanism, is repeated until the whole substrate is exposed in patterns of a desired number. |
