| 摘要 |
1,203,115. Projection printing; holography. SIEMENS A.G. Jan.16, 1968 [Jan.17, 1967], No.2310/68. Headings G2A and G2J. In projection printing apparatus, a pattern 6, placed at the focal plane on the object side of a collimotor 5 of a telecentric ray system, is illuminated via a condenser 4 by a mercury vapour lamp 3, and then a focal parallel beam formed by the collimator is divided by individual reducing optical systems 7 into a plurality of individual beams each forming an associated image pattern 8. These patterns are used to expose a photo-sensitive layer 2 to give an array of the pattern 6. The layer is either aphoto-resist varnish on a semi-conductor 1 or is a layer of emulsion on a photographic plate which is later developed to form a stencil for use in the manufacture of semi-conductors. If desired, a common objective 9 may be used to further reduce the pattern size. The actinic light from the lamp 3 may be filtered out so that the array can be correctly positioned on the layer 2 before exposure is made. The lamp 3 and condenser 4 may be replaced by a laser (13) Fig.2, (not shown) part of the radiation (14) being split off to form a reference beam so that a hologram of the image patterns 8 is formed on a photographic plate (15). For the production of a stencil the developed plate is exposed to laser radiation (16) Fig.3, (not shown) giving rise to real image patterns (17) similar to the patterns 8. These patterns (17) are imaged on to a photo-resist varnish layer on a semi-conductor. |
