| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lapping polishing cloth which can reduce occurrence of chipping. <P>SOLUTION: According to the lapping polishing cloth, a number of projections are regularly arranged on a substrate, and each projection is formed into a truncated conical shape having an angle θ formed by an upper surface and a side surface thereof set to the range of 105°<θ≤135°, or formed into an inverted truncated conical shape having the angle θ formed by the upper surface and the side surface set to the range of 45°≤θ<75°. Further provided that a total area of the upper surfaces of the projections is represented by S<SB>1</SB>, a polishing cloth surface area by S<SB>2</SB>, a height of each projection by H, a diameter of each upper surface by D<SB>1</SB>, and a diameter of a pore to be formed in a polishing object by D, respectively, the following relationships hold: 0.1S<SB>2</SB>≤S<SB>1</SB>≤0.9S<SB>2</SB>, 50 μm≤H≤1 mm, and D<SB>1</SB>≥2D. <P>COPYRIGHT: (C)2009,JPO&INPIT |
