| 摘要 |
PURPOSE:To form a film with good performance at low cost by making the filter of a substrate formed by patterning glass or synthetic resin and providing a visual field limiting pattern. CONSTITUTION:Photosensitive glass is sliced to a 150-230mu thickness and irradi ated by a high-pressure mercury lamp (1kw) of 350nm for five minutes by using a photomask with a 160mu dark part as well as an exposing process by photoetching technique. Then, a heat treatment is carried out in a furnace of 600 deg.C for 50min to form the substrate 1 which has a 40mu dark part and a 160mu light part, colored films 2 and 3 (200mu) which cut off 70% of light by two are stuck on both surfaces with adhesives P, and glass plates 4 and 5 are stuck outside them to form the filter of 3m/m in thickness. Consequently, the filter which has a <=60 deg. visual field limit which is fit to the purpose is obtained.
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