发明名称 SEMICONDUCTOR MANUFACTURE SYSTEM AND DEVICE MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To reduce leakage gaseous chemical substance and enable highly precise device manufacturing, by providing a means for removing gas-like chemical substance entering from an in-line connection part. SOLUTION: An aligner 1 and a coater developer 40 are connected by an in-line system. An in-line board delivery path (wc) is blocked from the air and forms a pre-room(pr). The pre-room(pr) is provided with an evacuation system(es) for removing chemical substance entering from the coater developer 40 and a detecting means M for detecting a concentration of chemical substance. Doors D1, D2 at both sides of the pre-room(pr) open and close automatically according to an identification signal which informs execution of board delivery through a board delivery opening part of the aligner 1 and the coater developer 40 and have a lock function which disables the doors from opening when a concentration of a chemical substance detected by the detection means M exceeds a prescribed value. Forced evacuation is carried out by the evacuation system(es) with a fan.
申请公布号 JPH11204396(A) 申请公布日期 1999.07.30
申请号 JP19980002270 申请日期 1998.01.08
申请人 CANON INC 发明人 ARAKAWA TAKAYOSHI
分类号 H01L21/677;G03B27/52;G03F7/20;H01L21/00;H01L21/02;H01L21/027;(IPC1-7):H01L21/027;H01L21/68 主分类号 H01L21/677
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