发明名称 PELLICLE FOR LITHOGRAPHY
摘要 <p>PURPOSE:To increase a UV transmittability and to contrive the reduction of an exposing time and the improvement in the strength of the pellicle film without allow the film to yellow during use by using a high-polymer org. silicon compd. film as the pellicle for dustproofing. CONSTITUTION:The high-polymer org. silicon compd. film is used as the pellicle for dustproofing in an exposing system using substantially <=500nm light. This high-polymer org. silicon compd. film is formed by adequately dissolving the high-polymer org. silicon compd. into a solvent, such as benzene and toluene, then molding the soln. to a film-shaped material by a solvent caster method, etc., using a spin coater or knife coater. Since the high-polymer org. silicon compd. film is used in such a manner, the ray transmittability of UV rays having a short wavelength region of 210 to 500nm is high and the yellowing during use is obviated. Since the light transmittability is excellent, the exposing time is shortened and the pellicle film strength is improved by the formation of the thicker film.</p>
申请公布号 JPH02230245(A) 申请公布日期 1990.09.12
申请号 JP19890051290 申请日期 1989.03.03
申请人 SHIN ETSU CHEM CO LTD 发明人 HATANO ETSUO;KUBOTA YOSHIHIRO;YAMAMOTO AKIRA;SAKURADA TOYOHISA;IGUCHI MASAAKI
分类号 G03F1/62;H01L21/027 主分类号 G03F1/62
代理机构 代理人
主权项
地址