发明名称 DIODE ELEMENT AND MANUFACTURE THEREOF
摘要 PURPOSE:To simplify a manufacturing step and to improve light transmittance by forming an ohmic electrode layer made of continuous amorphouslike carbon or graphite when a diamond layer is grown as a semiconductor layer. CONSTITUTION:A metallic layer 2 made of tungsten W is formed on the first main face of a semiconductor layer 1 made of p-type diamond doped with boron B, and a Schottky barrier is formed between both. An amorphouslike carbon or graphite layer 3 formed by altering film forming condition when the layer 1 is grown is formed, and an ohmic junction is formed therebetween. Thus, since it is composed of the p-type diamond, its manufacture is facilitated, and since the ohmic electrode layer is formed of the amorphouslike carbon or graphite, light transmittance is improved, and accordingly a light emitted on a Schottky junction face is efficiently emitted externally.
申请公布号 JPH0234979(A) 申请公布日期 1990.02.05
申请号 JP19880185215 申请日期 1988.07.25
申请人 SHIMADZU CORP 发明人 SUZUKI JUNICHI;KAWARADA HIROSHI;HIRAKI AKIO
分类号 H01L33/34;H01L33/42 主分类号 H01L33/34
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