| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask capable of producing a high quality display device without depending upon the positioning accuracy and the dimensional accuracy of a mask pattern. SOLUTION: In the photomask 10 for producing the display device, plural plotting regions and plotting joint parts 14 formed between adjacent plotting regions in plural plotting regions are defined on the surface and a pattern 4 is formed on at least one of the plotting regions. The ratio of a pitch, at which the pattern 4 is formed, to a pitch of the plotting joint part 14 on the photomask 10 is an integer ratio, in which the least common multiple of the pitch of the pattern and the pitch of the plotting connecting part 14 becomes <=1 mm. |
