PLASMA-TYPE APPARATUS FOR ELIMINATING POWDER OF AFTER-PROCESS OF SEMICONDUCTOR TO EFFICIENTLY COLLECT SiO2 POWDER AND EMBODY ENVIRONMENT-FRIENDLY DUST COLLECTING APPARATUS

摘要

PURPOSE: A plasma-type apparatus for eliminating the powder of an after-process of a semiconductor is provided to efficiently collect SiO2 powder and embody an environment-friendly dust collecting apparatus by using a plasma discharge method and by eliminating the necessity of an additional treatment process or process apparatus for avoiding water pollution. CONSTITUTION: A plasma discharge part(10) forms a part of an exhaust system for purifying and exhausting the used gas of a semiconductor fabricating process. A dust collecting electrode(30) is of a tube type, made of an electroconductive material. A discharge electrode(20) is of a tube type and is inserted into the dust collecting electrode, made of an electroconductive material. An insulator(40) is installed between the dust collecting electrode and the discharge electrode. The plasma discharge part is composed of the dust collecting electrode, the discharge electrode and the insulator.