IMPROVED METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT CELL RE-USE
摘要
Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.
申请公布号
WO2010011560(A2)
申请公布日期
2010.01.28
申请号
WO2009US50834
申请日期
2009.07.16
申请人
KLA-TENCOR CORPORATION;ADEL, MICHAEL, E.;POSLAVSKY, LEONID;FIELDEN, JOHN;MADSEN, JONATHAN, MICHAEL;PETERS, ROBERT
发明人
ADEL, MICHAEL, E.;POSLAVSKY, LEONID;FIELDEN, JOHN;MADSEN, JONATHAN, MICHAEL;PETERS, ROBERT