发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To improve shelf stability and resist characteristics such as sensitivity and resolving power, to reduce curing temp. and to improve physical characteristics of a film by incorporating a specified polyamic acid compd., a photosensitive auxiliary having a photopolymerizable functional group, a photopolymn. initiator and a solvent. SOLUTION: This compsn. contains at least one of polyamic acid compds. represented by formulae I, II a photosensitive auxiliary having a photopolymerizable functional group, a photopolymn. initiator and a solvent. In the formula I, R<1> is a tetravalent org. group, R<2> is a divalent org. group, 1-100% of R<2> 's are divalent org. groups represented by formula III, (k) is an integer of 5-10,000 and Z<1> is an actinic ray functional group represented by formula IV. In the formula II, R<1> is a tetravalent org. group, R<2> is a divalent org. group, 1-100% of R<2> 's are divalent org. groups represented by formula III, (k) is an integer of 5-10,000 and Z<2> is an actinic ray functional group represented by formula V.
申请公布号 JPH09258438(A) 申请公布日期 1997.10.03
申请号 JP19960090241 申请日期 1996.03.19
申请人 NIPPON ZEON CO LTD;FUJITSU LTD 发明人 TANAKA AKIRA;KOSHIYAMA MASAMI;ITO KENICHI;YONEDA YASUHIRO;YOKOUCHI KISHIO;MIZUTANI DAISUKE;ISHIZUKI YOSHIKATSU
分类号 G03F7/027;C08L79/08;G03F7/038;H01L21/027;(IPC1-7):G03F7/027 主分类号 G03F7/027
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