| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for aftertraetment of the residue from the direct synthesis of an organochlorosilane. SOLUTION: In this method for preparing an alkylchlorosilanes from the liquid constitutents of the residues from the direct synthesis of alkylchlorosilanes which have a boiling point of above 70 deg.C at 1013 hPa and comprise disilanes, the residues are heated with hydrogen chloride and silicon at temperatures of at least 300 deg.C, with at least 10% by weight of trichlorosilane and/or tetrachlorosilane, based on the weight of the alkylchlorosilane formed, being formed at the same time.
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