发明名称 |
Electron microscope and method of adjusting monochromator |
摘要 |
An electron microscope is offered which can facilitate adjusting a monochromator. The electron microscope (100) includes the monochromator (20) having an energy filter (22) for dispersing the beam (EB) according to energy and a slit plate (24) disposed on an energy dispersive plane. The slit plate (24) is provided with plural energy-selecting slits (25) which are different in width taken in a direction where the beam (EB) is dispersed. The microscope (100) further includes a lens system (30) on which the beam impinges after being monochromatized by the monochromator (20), a first measuring section (50) for measuring the intensity of the beam (EB) emitted from an electron beam source (10), a second measuring section (60) for measuring the intensity of the beam (EB) that has passed through an active one (25-L) of the energy-selecting slits (25), and a slit identifying portion (72) for identifying the active energy-selecting slit (25-L) from the plural energy-selecting slits (25) on the basis of the results of measurements made by the first and second measuring sections (50, 60). |
申请公布号 |
US9362082(B2) |
申请公布日期 |
2016.06.07 |
申请号 |
US201514823141 |
申请日期 |
2015.08.11 |
申请人 |
JEOL Ltd. |
发明人 |
Mukai Masaki |
分类号 |
H01J47/00;H01J37/05;H01J37/21 |
主分类号 |
H01J47/00 |
代理机构 |
The Webb Law Firm |
代理人 |
The Webb Law Firm |
主权项 |
1. An electron microscope comprising:
an electron beam source emitting an electron beam; a monochromator having an energy filter for dispersing the electron beam according to energy and a slit plate placed on an energy dispersive plane, the slit plate being provided with plural energy-selecting slits that are different in width taken in a direction where the electron beam is dispersed; a lens system on which the electron beam impinges after the beam is monochromatized by the monochromator; a first measuring section for measuring the intensity of the electron beam emitted from the electron beam source; a second measuring section for measuring the intensity of the electron beam that has passed through an active one of the energy-selecting slits; and a slit identifying portion for identifying the active energy-selecting slit through which the beam has passed from among the plural energy-selecting slits on the basis of results of measurements made by the first and second measuring sections. |
地址 |
Tokyo JP |