发明名称 Semiconductor component arrangement comprising a trench transistor
摘要 Disclosed is a semiconductor component arrangement and a method for producing a semiconductor component arrangement. The method comprises producing a trench transistor structure with at least one trench disposed in the semiconductor body and with at least a gate electrode disposed in the at least one trench. An electrode structure is disposed in at least one further trench and comprises an at least one electrode. The at least one trench of the transistor structure and the at least one further trench are produced by common process steps. Furthermore, the at least one electrode of the electrode structure and the gate electrode are produced by common process steps.
申请公布号 US2007215920(A1) 申请公布日期 2007.09.20
申请号 US20070715275 申请日期 2007.03.07
申请人 INFINEON TECHNOLOGIES AG 发明人 ZUNDEL MARKUS;HIRLER FRANZ;KRISCHKE NORBERT
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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