发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device, in which current collapse phenomenon is suppressed. SOLUTION: The semiconductor device 111 includes, on the upper surface thereof, a current collapse suppression film 125 constituted of molecules whose molecular orientation is controlled so that the positive charge part of permanent bipole in the molecule is faced downward. Such orientation control becomes possible by digging a groove 159 on an insulating film 123. The current collapse phenomenon caused by an electron trapped in a semiconductor substrate 121 after impressing high voltage can be suppressed nicely by the effect of the current collapse suppression film 125. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008210934(A) 申请公布日期 2008.09.11
申请号 JP20070045190 申请日期 2007.02.26
申请人 SANKEN ELECTRIC CO LTD 发明人 EBARA TOSHIHIRO
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
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