发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device including: an insulated gate type transistor having a columnar semiconductor region formed on the main side of a semiconductor substrate, a gate electrode formed on the side surface of the columnar semiconductor region while interposing a gate insulating film and main electrode regions respectively formed on and formed below the columnar semiconductor region; and a memory element which is formed on the upper main electrode region and which can be broken electrically. <IMAGE>
申请公布号 EP0510604(A3) 申请公布日期 2001.05.09
申请号 EP19920106870 申请日期 1992.04.22
申请人 CANON KABUSHIKI KAISHA 发明人 KIKUCHI, SHIN;MIYAWAKI, MAMORU;MONMA, GENZO;OHZU, HAYAO;INOUE, SHUNSUKE;NAKAMURA, YOSHIO;ICHIKAWA, TAKESHI;IKEDA, OSAMU;KOHCHI, TETSUNOBU
分类号 H01L27/115;(IPC1-7):H01L27/112;H01L27/092;H01L23/525;H01L29/78;H01L27/108 主分类号 H01L27/115
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